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Physical Vapor Transport Growth of Antiferromagnetic CrCl(3) Flakes Down to Monolayer Thickness

The van der Waals magnets CrX(3) (X = I, Br, and Cl) exhibit highly tunable magnetic properties and are promising candidates for developing novel two‐dimensional (2D) spintronic devices such as magnetic tunnel junctions and spin tunneling transistors. Previous studies of the antiferromagnetic CrCl(3...

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Autores principales: Wang, Jia, Ahmadi, Zahra, Lujan, David, Choe, Jeongheon, Taniguchi, Takashi, Watanabe, Kenji, Li, Xiaoqin, Shield, Jeffrey E., Hong, Xia
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9875658/
https://www.ncbi.nlm.nih.gov/pubmed/36453569
http://dx.doi.org/10.1002/advs.202203548
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author Wang, Jia
Ahmadi, Zahra
Lujan, David
Choe, Jeongheon
Taniguchi, Takashi
Watanabe, Kenji
Li, Xiaoqin
Shield, Jeffrey E.
Hong, Xia
author_facet Wang, Jia
Ahmadi, Zahra
Lujan, David
Choe, Jeongheon
Taniguchi, Takashi
Watanabe, Kenji
Li, Xiaoqin
Shield, Jeffrey E.
Hong, Xia
author_sort Wang, Jia
collection PubMed
description The van der Waals magnets CrX(3) (X = I, Br, and Cl) exhibit highly tunable magnetic properties and are promising candidates for developing novel two‐dimensional (2D) spintronic devices such as magnetic tunnel junctions and spin tunneling transistors. Previous studies of the antiferromagnetic CrCl(3) have mainly focused on mechanically exfoliated samples. Controlled synthesis of high quality atomically thin flakes is critical for their technological implementation but has not been achieved to date. This work reports the growth of large CrCl(3) flakes down to monolayer thickness via the physical vapor transport technique. Both isolated flakes with well‐defined facets and long stripe samples with the trilayer portion exceeding 60 µm have been obtained. High‐resolution transmission electron microscopy studies show that the CrCl(3) flakes are single crystalline in the monoclinic structure, consistent with the Raman results. The room temperature stability of the CrCl(3) flakes decreases with decreasing thickness. The tunneling magnetoresistance of graphite/CrCl(3)/graphite tunnel junctions confirms that few‐layer CrCl(3) possesses in‐plane magnetic anisotropy and Néel temperature of 17 K. This study paves the path for developing CrCl(3)‐based scalable 2D spintronic applications.
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spelling pubmed-98756582023-01-25 Physical Vapor Transport Growth of Antiferromagnetic CrCl(3) Flakes Down to Monolayer Thickness Wang, Jia Ahmadi, Zahra Lujan, David Choe, Jeongheon Taniguchi, Takashi Watanabe, Kenji Li, Xiaoqin Shield, Jeffrey E. Hong, Xia Adv Sci (Weinh) Research Articles The van der Waals magnets CrX(3) (X = I, Br, and Cl) exhibit highly tunable magnetic properties and are promising candidates for developing novel two‐dimensional (2D) spintronic devices such as magnetic tunnel junctions and spin tunneling transistors. Previous studies of the antiferromagnetic CrCl(3) have mainly focused on mechanically exfoliated samples. Controlled synthesis of high quality atomically thin flakes is critical for their technological implementation but has not been achieved to date. This work reports the growth of large CrCl(3) flakes down to monolayer thickness via the physical vapor transport technique. Both isolated flakes with well‐defined facets and long stripe samples with the trilayer portion exceeding 60 µm have been obtained. High‐resolution transmission electron microscopy studies show that the CrCl(3) flakes are single crystalline in the monoclinic structure, consistent with the Raman results. The room temperature stability of the CrCl(3) flakes decreases with decreasing thickness. The tunneling magnetoresistance of graphite/CrCl(3)/graphite tunnel junctions confirms that few‐layer CrCl(3) possesses in‐plane magnetic anisotropy and Néel temperature of 17 K. This study paves the path for developing CrCl(3)‐based scalable 2D spintronic applications. John Wiley and Sons Inc. 2022-12-01 /pmc/articles/PMC9875658/ /pubmed/36453569 http://dx.doi.org/10.1002/advs.202203548 Text en © 2022 The Authors. Advanced Science published by Wiley‐VCH GmbH https://creativecommons.org/licenses/by/4.0/This is an open access article under the terms of the http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
spellingShingle Research Articles
Wang, Jia
Ahmadi, Zahra
Lujan, David
Choe, Jeongheon
Taniguchi, Takashi
Watanabe, Kenji
Li, Xiaoqin
Shield, Jeffrey E.
Hong, Xia
Physical Vapor Transport Growth of Antiferromagnetic CrCl(3) Flakes Down to Monolayer Thickness
title Physical Vapor Transport Growth of Antiferromagnetic CrCl(3) Flakes Down to Monolayer Thickness
title_full Physical Vapor Transport Growth of Antiferromagnetic CrCl(3) Flakes Down to Monolayer Thickness
title_fullStr Physical Vapor Transport Growth of Antiferromagnetic CrCl(3) Flakes Down to Monolayer Thickness
title_full_unstemmed Physical Vapor Transport Growth of Antiferromagnetic CrCl(3) Flakes Down to Monolayer Thickness
title_short Physical Vapor Transport Growth of Antiferromagnetic CrCl(3) Flakes Down to Monolayer Thickness
title_sort physical vapor transport growth of antiferromagnetic crcl(3) flakes down to monolayer thickness
topic Research Articles
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9875658/
https://www.ncbi.nlm.nih.gov/pubmed/36453569
http://dx.doi.org/10.1002/advs.202203548
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