Nanoporous Metal–Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics

[Image: see text] Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal–organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxyl...

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Detalles Bibliográficos
Autores principales: Multia, Jenna, Kravchenko, Dmitry E., Rubio-Giménez, Víctor, Philip, Anish, Ameloot, Rob, Karppinen, Maarit
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9887593/
https://www.ncbi.nlm.nih.gov/pubmed/36743856
http://dx.doi.org/10.1021/acsanm.2c04934
Descripción
Sumario:[Image: see text] Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal–organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.

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