Nanoporous Metal–Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics

[Image: see text] Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal–organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxyl...

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Autores principales: Multia, Jenna, Kravchenko, Dmitry E., Rubio-Giménez, Víctor, Philip, Anish, Ameloot, Rob, Karppinen, Maarit
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9887593/
https://www.ncbi.nlm.nih.gov/pubmed/36743856
http://dx.doi.org/10.1021/acsanm.2c04934
_version_ 1784880373258256384
author Multia, Jenna
Kravchenko, Dmitry E.
Rubio-Giménez, Víctor
Philip, Anish
Ameloot, Rob
Karppinen, Maarit
author_facet Multia, Jenna
Kravchenko, Dmitry E.
Rubio-Giménez, Víctor
Philip, Anish
Ameloot, Rob
Karppinen, Maarit
author_sort Multia, Jenna
collection PubMed
description [Image: see text] Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal–organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.
format Online
Article
Text
id pubmed-9887593
institution National Center for Biotechnology Information
language English
publishDate 2023
publisher American Chemical Society
record_format MEDLINE/PubMed
spelling pubmed-98875932023-02-01 Nanoporous Metal–Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics Multia, Jenna Kravchenko, Dmitry E. Rubio-Giménez, Víctor Philip, Anish Ameloot, Rob Karppinen, Maarit ACS Appl Nano Mater [Image: see text] Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal–organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF. American Chemical Society 2023-01-10 /pmc/articles/PMC9887593/ /pubmed/36743856 http://dx.doi.org/10.1021/acsanm.2c04934 Text en © 2023 The Authors. Published by American Chemical Society https://creativecommons.org/licenses/by/4.0/Permits the broadest form of re-use including for commercial purposes, provided that author attribution and integrity are maintained (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Multia, Jenna
Kravchenko, Dmitry E.
Rubio-Giménez, Víctor
Philip, Anish
Ameloot, Rob
Karppinen, Maarit
Nanoporous Metal–Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics
title Nanoporous Metal–Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics
title_full Nanoporous Metal–Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics
title_fullStr Nanoporous Metal–Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics
title_full_unstemmed Nanoporous Metal–Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics
title_short Nanoporous Metal–Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics
title_sort nanoporous metal–organic framework thin films prepared directly from gaseous precursors by atomic and molecular layer deposition: implications for microelectronics
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9887593/
https://www.ncbi.nlm.nih.gov/pubmed/36743856
http://dx.doi.org/10.1021/acsanm.2c04934
work_keys_str_mv AT multiajenna nanoporousmetalorganicframeworkthinfilmsprepareddirectlyfromgaseousprecursorsbyatomicandmolecularlayerdepositionimplicationsformicroelectronics
AT kravchenkodmitrye nanoporousmetalorganicframeworkthinfilmsprepareddirectlyfromgaseousprecursorsbyatomicandmolecularlayerdepositionimplicationsformicroelectronics
AT rubiogimenezvictor nanoporousmetalorganicframeworkthinfilmsprepareddirectlyfromgaseousprecursorsbyatomicandmolecularlayerdepositionimplicationsformicroelectronics
AT philipanish nanoporousmetalorganicframeworkthinfilmsprepareddirectlyfromgaseousprecursorsbyatomicandmolecularlayerdepositionimplicationsformicroelectronics
AT amelootrob nanoporousmetalorganicframeworkthinfilmsprepareddirectlyfromgaseousprecursorsbyatomicandmolecularlayerdepositionimplicationsformicroelectronics
AT karppinenmaarit nanoporousmetalorganicframeworkthinfilmsprepareddirectlyfromgaseousprecursorsbyatomicandmolecularlayerdepositionimplicationsformicroelectronics

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