Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance

[Image: see text] The absorption of extreme ultraviolet (EUV) radiation by a photoresist strongly depends on its atomic composition. Consequently, elements with a high EUV absorption cross section can assist in meeting the demand for higher photon absorbance by the photoresist to improve the sensiti...

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Detalles Bibliográficos
Autores principales: Thakur, Neha, Vockenhuber, Michaela, Ekinci, Yasin, Watts, Benjamin, Giglia, Angelo, Mahne, Nicola, Nannarone, Stefano, Castellanos, Sonia, Brouwer, Albert M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9888611/
https://www.ncbi.nlm.nih.gov/pubmed/36855383
http://dx.doi.org/10.1021/acsmaterialsau.1c00059

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9888611/
https://www.ncbi.nlm.nih.gov/pubmed/36855383
http://dx.doi.org/10.1021/acsmaterialsau.1c00059

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