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Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance
[Image: see text] The absorption of extreme ultraviolet (EUV) radiation by a photoresist strongly depends on its atomic composition. Consequently, elements with a high EUV absorption cross section can assist in meeting the demand for higher photon absorbance by the photoresist to improve the sensiti...
Autores principales: | Thakur, Neha, Vockenhuber, Michaela, Ekinci, Yasin, Watts, Benjamin, Giglia, Angelo, Mahne, Nicola, Nannarone, Stefano, Castellanos, Sonia, Brouwer, Albert M. |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Chemical Society
2022
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9888611/ https://www.ncbi.nlm.nih.gov/pubmed/36855383 http://dx.doi.org/10.1021/acsmaterialsau.1c00059 |
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