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Real-Time Ellipsometry at High and Low Temperatures

[Image: see text] Among the many available real-time characterization methods, ellipsometry stands out with the combination of high sensitivity and high speed as well as nondestructive, spectroscopic, and complex modeling capabilities. The thicknesses of thin films such as the complex dielectric fun...

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Autores principales: Mukherjee, Deshabrato, Petrik, Peter
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9893259/
https://www.ncbi.nlm.nih.gov/pubmed/36743061
http://dx.doi.org/10.1021/acsomega.2c07438
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author Mukherjee, Deshabrato
Petrik, Peter
author_facet Mukherjee, Deshabrato
Petrik, Peter
author_sort Mukherjee, Deshabrato
collection PubMed
description [Image: see text] Among the many available real-time characterization methods, ellipsometry stands out with the combination of high sensitivity and high speed as well as nondestructive, spectroscopic, and complex modeling capabilities. The thicknesses of thin films such as the complex dielectric function can be determined simultaneously with precisions down to sub-nanometer and 10(–4), respectively. Consequently, the first applications of high- and low-temperature real-time ellipsometry have been related to the monitoring of layer growth and the determination of optical properties of metals, semiconductors, and superconductors, dating back to the late 1960s. Ellipsometry has been ever since a steady alternative of nonpolarimetric spectroscopies in applications where quantitative information (e.g., thickness, crystallinity, porosity, band gap, absorption) is to be determined in complex layered structures. In this article the main applications and fields of research are reviewed.
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spelling pubmed-98932592023-02-03 Real-Time Ellipsometry at High and Low Temperatures Mukherjee, Deshabrato Petrik, Peter ACS Omega [Image: see text] Among the many available real-time characterization methods, ellipsometry stands out with the combination of high sensitivity and high speed as well as nondestructive, spectroscopic, and complex modeling capabilities. The thicknesses of thin films such as the complex dielectric function can be determined simultaneously with precisions down to sub-nanometer and 10(–4), respectively. Consequently, the first applications of high- and low-temperature real-time ellipsometry have been related to the monitoring of layer growth and the determination of optical properties of metals, semiconductors, and superconductors, dating back to the late 1960s. Ellipsometry has been ever since a steady alternative of nonpolarimetric spectroscopies in applications where quantitative information (e.g., thickness, crystallinity, porosity, band gap, absorption) is to be determined in complex layered structures. In this article the main applications and fields of research are reviewed. American Chemical Society 2023-01-17 /pmc/articles/PMC9893259/ /pubmed/36743061 http://dx.doi.org/10.1021/acsomega.2c07438 Text en © 2023 The Authors. Published by American Chemical Society https://creativecommons.org/licenses/by/4.0/Permits the broadest form of re-use including for commercial purposes, provided that author attribution and integrity are maintained (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Mukherjee, Deshabrato
Petrik, Peter
Real-Time Ellipsometry at High and Low Temperatures
title Real-Time Ellipsometry at High and Low Temperatures
title_full Real-Time Ellipsometry at High and Low Temperatures
title_fullStr Real-Time Ellipsometry at High and Low Temperatures
title_full_unstemmed Real-Time Ellipsometry at High and Low Temperatures
title_short Real-Time Ellipsometry at High and Low Temperatures
title_sort real-time ellipsometry at high and low temperatures
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9893259/
https://www.ncbi.nlm.nih.gov/pubmed/36743061
http://dx.doi.org/10.1021/acsomega.2c07438
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