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Rapid Uniformity Analysis of Fully Printed SWCNT-Based Thin Film Transistor Arrays via Roll-to-Roll Gravure Process

The roll-to-roll (R2R) gravure process has the potential for manufacturing single-wall carbon nanotubes (SWCNT)-based thin film transistor (TFT) arrays on a flexible plastic substrate. A significant hurdle toward the commercialization of the R2R-printed SWCNT-TFT array is the lack of a suitable, sim...

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Autores principales: Choi, Yunhyok, Jung, Younsu, Song, Reem, Park, Jinhwa, Parajuli, Sajjan, Shrestha, Sagar, Cho, Gyoujin, Kim, Byung-Sung
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9920362/
https://www.ncbi.nlm.nih.gov/pubmed/36770552
http://dx.doi.org/10.3390/nano13030590
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author Choi, Yunhyok
Jung, Younsu
Song, Reem
Park, Jinhwa
Parajuli, Sajjan
Shrestha, Sagar
Cho, Gyoujin
Kim, Byung-Sung
author_facet Choi, Yunhyok
Jung, Younsu
Song, Reem
Park, Jinhwa
Parajuli, Sajjan
Shrestha, Sagar
Cho, Gyoujin
Kim, Byung-Sung
author_sort Choi, Yunhyok
collection PubMed
description The roll-to-roll (R2R) gravure process has the potential for manufacturing single-wall carbon nanotubes (SWCNT)-based thin film transistor (TFT) arrays on a flexible plastic substrate. A significant hurdle toward the commercialization of the R2R-printed SWCNT-TFT array is the lack of a suitable, simple, and rapid method for measuring the uniformity of printed products. We developed a probing instrument for characterizing R2R gravure printed TFT, named PICR2R-TFT, for rapidly characterizing R2R-printed SWCNT-TFT array that can present a geographical distribution profile to pinpoint the failed devices in an SWCNT-TFT array. Using the newly developed PICR2R-TFT instrument, the current–voltage characteristics of the fabricated SWCNT-TFT devices could be correlated to various R2R-printing process parameters, such as channel length, roll printing length, and printing speed. Thus, by introducing a characterization tool that is reliable and fast, one can quickly optimize the R2R gravure printing conditions to enhance product uniformity, thereby maximizing the yield of printed SWCNT-TFT arrays.
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spelling pubmed-99203622023-02-12 Rapid Uniformity Analysis of Fully Printed SWCNT-Based Thin Film Transistor Arrays via Roll-to-Roll Gravure Process Choi, Yunhyok Jung, Younsu Song, Reem Park, Jinhwa Parajuli, Sajjan Shrestha, Sagar Cho, Gyoujin Kim, Byung-Sung Nanomaterials (Basel) Article The roll-to-roll (R2R) gravure process has the potential for manufacturing single-wall carbon nanotubes (SWCNT)-based thin film transistor (TFT) arrays on a flexible plastic substrate. A significant hurdle toward the commercialization of the R2R-printed SWCNT-TFT array is the lack of a suitable, simple, and rapid method for measuring the uniformity of printed products. We developed a probing instrument for characterizing R2R gravure printed TFT, named PICR2R-TFT, for rapidly characterizing R2R-printed SWCNT-TFT array that can present a geographical distribution profile to pinpoint the failed devices in an SWCNT-TFT array. Using the newly developed PICR2R-TFT instrument, the current–voltage characteristics of the fabricated SWCNT-TFT devices could be correlated to various R2R-printing process parameters, such as channel length, roll printing length, and printing speed. Thus, by introducing a characterization tool that is reliable and fast, one can quickly optimize the R2R gravure printing conditions to enhance product uniformity, thereby maximizing the yield of printed SWCNT-TFT arrays. MDPI 2023-02-01 /pmc/articles/PMC9920362/ /pubmed/36770552 http://dx.doi.org/10.3390/nano13030590 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Choi, Yunhyok
Jung, Younsu
Song, Reem
Park, Jinhwa
Parajuli, Sajjan
Shrestha, Sagar
Cho, Gyoujin
Kim, Byung-Sung
Rapid Uniformity Analysis of Fully Printed SWCNT-Based Thin Film Transistor Arrays via Roll-to-Roll Gravure Process
title Rapid Uniformity Analysis of Fully Printed SWCNT-Based Thin Film Transistor Arrays via Roll-to-Roll Gravure Process
title_full Rapid Uniformity Analysis of Fully Printed SWCNT-Based Thin Film Transistor Arrays via Roll-to-Roll Gravure Process
title_fullStr Rapid Uniformity Analysis of Fully Printed SWCNT-Based Thin Film Transistor Arrays via Roll-to-Roll Gravure Process
title_full_unstemmed Rapid Uniformity Analysis of Fully Printed SWCNT-Based Thin Film Transistor Arrays via Roll-to-Roll Gravure Process
title_short Rapid Uniformity Analysis of Fully Printed SWCNT-Based Thin Film Transistor Arrays via Roll-to-Roll Gravure Process
title_sort rapid uniformity analysis of fully printed swcnt-based thin film transistor arrays via roll-to-roll gravure process
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9920362/
https://www.ncbi.nlm.nih.gov/pubmed/36770552
http://dx.doi.org/10.3390/nano13030590
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