Cargando…
A study of hydrogen plasma-induced charging effect in EUV lithography systems
In the extreme ultraviolet lithography system, EUV-induced hydrogen plasma charging effect is observed by in situ embedded micro-detector array. The 4k-pixel on-wafer array can detect and store the distributions of H(2) plasma in each in-pixel floating gate for non-destructive off-line read. The loc...
| Autores principales: | , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer US
2023
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9950305/ https://www.ncbi.nlm.nih.gov/pubmed/36823307 http://dx.doi.org/10.1186/s11671-023-03799-4 |