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A study of hydrogen plasma-induced charging effect in EUV lithography systems
In the extreme ultraviolet lithography system, EUV-induced hydrogen plasma charging effect is observed by in situ embedded micro-detector array. The 4k-pixel on-wafer array can detect and store the distributions of H(2) plasma in each in-pixel floating gate for non-destructive off-line read. The loc...
Autores principales: | Huang, Yao-Hung, Lin, Chrong Jung, King, Ya-Chin |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer US
2023
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9950305/ https://www.ncbi.nlm.nih.gov/pubmed/36823307 http://dx.doi.org/10.1186/s11671-023-03799-4 |
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