Polishing Approaches at Atomic and Close-to-Atomic Scale

Roughness down to atomic and close-to-atomic scale is receiving an increasing attention in recent studies of manufacturing development, which can be realized by high-precision polishing processes. This review presents polishing approaches at atomic and close-to-atomic scale on planar and curved surf...

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Detalles Bibliográficos
Autores principales: Geng, Zhichao, Huang, Ning, Castelli, Marco, Fang, Fengzhou
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9968022/
https://www.ncbi.nlm.nih.gov/pubmed/36838045
http://dx.doi.org/10.3390/mi14020343

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9968022/
https://www.ncbi.nlm.nih.gov/pubmed/36838045
http://dx.doi.org/10.3390/mi14020343

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