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Polishing Approaches at Atomic and Close-to-Atomic Scale
Roughness down to atomic and close-to-atomic scale is receiving an increasing attention in recent studies of manufacturing development, which can be realized by high-precision polishing processes. This review presents polishing approaches at atomic and close-to-atomic scale on planar and curved surf...
Autores principales: | Geng, Zhichao, Huang, Ning, Castelli, Marco, Fang, Fengzhou |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9968022/ https://www.ncbi.nlm.nih.gov/pubmed/36838045 http://dx.doi.org/10.3390/mi14020343 |
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