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  1. 2161
    “…Scarcity of the antisolvent polymer dielectrics and their poor stability have significantly prevented solution-processed ultraflexible organic transistors from low-temperature, large-scale production for applications in low-cost skin-inspired electronics. …”
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  2. 2162
  3. 2163
    por Chakraborty, Surajit, Kim, Tae-Woo
    Publicado 2022
    “…The reliability instability of inhomogeneous Schottky contact behaviors of Ni/Au and Pt/Ti/Pt/Au gate contacts on AlGaN/GaN high-electron-mobility transistors (HEMTs) was investigated via off-state stress and temperature. …”
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  4. 2164
    “…Catalyst removal is necessary to avoid catalyst melting during temperature increase prior to a-Si shell deposition. Field effect transistors based on Ge-core/a-Si-shell nanowires exhibited p-channel depletion-mode characteristics as a result of free hole accumulation in the Ge channel. …”
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  5. 2165
    “…A metal-oxide-semiconductor high-electron-mobility transistor (MOS-HEMT) is proposed based on using a Al(2)O(3)/ZrO(2) stacked layer on conventional AlGaN/GaN HEMT to suppress the gate leakage current, decrease flicker noise, increase high-frequency performance, improve power performance, and enhance the stability after thermal stress or time stress. …”
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  6. 2166
    Materias:
    Libro
  7. 2167
    “…These are critical characteristics that qualify the performance of optoelectronic devices, particularly field-effect transistor components (FETs). Here, the hybrid compound 2-amino-5-picoline tetrachloroferrate(iii) (2A5PFeCl(4)) was synthesised by using the slow evaporation solution growth method at room temperature. …”
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  8. 2168
    por Al-Mohammed, Huda Ibrahim
    Publicado 2011
    “…Thermoluminescent dosimeters (TLDs) and the OneDose(™) metal oxide semiconductor field effect transistor (MOSFET) detectors are used during treatment delivery to measure the radiation dose and compare it with the target prescribed dose. …”
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  9. 2169
    “…The Front Cover picture shows an electrical bioassay for the label‐free and highly‐sensitive detection of a histidine‐rich protein (serum albumin) using an organic filed‐effect transistor (an OFET) modified with a Ni(II)‐trinitriloacetic acid monolayer (Ni(II)‐nta). …”
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  10. 2170
  11. 2171
    “…Electrical characteristics of amorphous In-Ga-Zn-O (a-IGZO) thin-film transistors (TFTs) are compared by using O(2) plasma-enhanced atomic layer deposition Al(2)O(3) dielectrics at different temperatures. …”
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  12. 2172
  13. 2173
    “…Forbes takes a critical view of our paper on nanoscale vacuum channel transistors (NVCTs), arguing mainly about the weaknesses in the theory of field electron emission. …”
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  14. 2174
  15. 2175
    por Forbes, Richard G.
    Publicado 2021
    “…These comments aim to correct some apparent weaknesses in the theory of field electron emission given in a recent paper about nanoscale vacuum channel transistors, and to improve the presentation of this theory. …”
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  16. 2176
    “…Amorphous oxide semiconductor (AOS) field-effect transistors (FETs) have been integrated with complementary metal-oxide-semiconductor (CMOS) circuitry in the back end of line (BEOL) CMOS process; they are promising devices creating new and various functionalities. …”
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  17. 2177
    “…The effects of barrier layer thickness, Al component of barrier layer, and passivation layer thickness of high-resistance Si (111)-based AlGaN/GaN heterojunction epitaxy on the knee-point voltage (V(knee)), saturation current density (I(d-sat)), and cut-off frequency (f(t)) of its high electron mobility transistor (HEMT) are simulated and analyzed. A novel optimization factor OPTIM is proposed by considering the various performance parameters of the device to reduce the V(knee) and improve the I(d-sat) on the premise of ensuring the f(t). …”
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  18. 2178
    por Lenk, John D.
    Publicado 1976
    Materias: “…Transistores de efecto de campo.…”
    Libro
  19. 2179
    “…InAlN/Al/GaN high electron mobility transistors (HEMTs) directly on Si with dynamic threshold voltage for steep subthreshold slope (<60 mV/dec) are demonstrated in this study, and attributed to displacement charge transition effects. …”
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  20. 2180
    por Keum, Dongmin, Kim, Hyungtak
    Publicado 2019
    “…In this work, we investigated the time-dependent dielectric breakdown (TDDB) characteristics of normally-off AlGaN/GaN gate-recessed metal–insulator–semiconductor (MIS) heterostructure field effect transistors (HFETs) submitted to proton irradiation. …”
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