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  1. 4421
    “…The proposed device is comprised of a voltage divider and a current driver in which SiNWs are used as photodetector and field-effect transistors; it has the functions of detecting light, generating a stimulation signal in proportion to the light intensity, and transmitting the signal to a micro electrode. …”
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  2. 4422
    “…In order to investigate the effect of surface-oxide reduction on metal-insulator-semiconductor (MIS) properties, capacitors and field-effect transistors (FETs) were fabricated by changing the TMA dosage during the interface formation stage. …”
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  3. 4423
    “…In this paper, a Least Mean Square (LMS) programming scheme is used to set the offset voltage of two operational amplifiers that were built using floating-gate transistors, enabling a 0.95 V(RMS) trimmer-less flame detection sensor. …”
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  4. 4424
    “…The Schottky junction source/drain structure has great potential to replace the traditional p/n junction source/drain structure of the future ultra-scaled metal-oxide-semiconductor field effect transistors (MOSFETs), as it can form ultimately shallow junctions. …”
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  5. 4425
    “…Employing ionic-liquid-based dynamic template during meniscus-guided coating results in highly aligned, highly crystalline donor–acceptor polymer thin films over large area (>1 cm(2)) and promoted charge transport along both the polymer backbone and the π–π stacking direction in field-effect transistors. We further demonstrate that the charge transport anisotropy can be reversed by tuning the degree of polymer backbone alignment.…”
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  6. 4426
    “…A certain threshold voltage (V(T)) is required before this can be observed, and its origins are similar to that of the threshold voltage in metal oxide semiconductor field effect transistors. A physical model serves to explain the large photocurrents underneath SiO(2) by the formation of an inversion layer in Si. …”
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  7. 4427
    “…The charge-carrier transport properties of the diindeno[1,2-b:2′,1′-n]perylene-5,12-dione and diindeno[1,2-b:2′,1′-n]perylene derivatives were investigated through the fabrication and characterization of field-effect transistors via both vacuum-deposited and solution-processed films, respectively. …”
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  8. 4428
    “…Fe atoms were doped at the Sn atom sites, and the Fe contents are ∼2.1%, 1.5%, and 1.1%. The field-effect transistors based on the Fe(0.021)Sn(0.979)S(2) monolayer show n-type behavior and exhibit high optoelectronic performance. …”
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  9. 4429
    “…Finally, the extension of 1D piezoelectric materials in field effect transistors and optoelectronic devices are simply introduced.…”
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  10. 4430
    “…[Image: see text] We report a design strategy that allows the preparation of solution processable n-type materials from low boiling point solvents for organic electrochemical transistors (OECTs). The polymer backbone is based on NDI-T2 copolymers where a branched alkyl side chain is gradually exchanged for a linear ethylene glycol-based side chain. …”
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  11. 4431
    “…It was found that 5b behaved as a p-type organic semiconductor in solution-processed thin film transistors with a field effect mobility of up to 0.025 cm(2) V(–1) s(–1).…”
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  12. 4432
    “…The surface potential on the oxide-functionalized electrode of the extended gate was directly measured using full electrical circuits with the commercial metal-oxide semiconductor field-effect transistors (MOSFETs) and ring oscillator components, which resulted in cost-effective, portable and scalable real-time nucleic acid analysis. …”
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  13. 4433
    “…Epitaxial lateral growth will be required if complex diamond-based device architecture, such as, for example, Metal-oxide-semiconductor Field-effect transistors (MOSFETs) or epitaxial lateral overgrowth (ELO) substrates, need to be developed for high-power applications. …”
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  14. 4434
    “…These findings make it possible to fabricate advanced Ge-based devices including high-speed thin-film transistors.…”
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  15. 4435
    “…We have designed and then grown a simple structure for high electron mobility transistors (HEMTs) on silicon, where as usual two transitional layers of Al(x)Ga(1−x)N (x = 0.35, x = 0.17) have been used in order to engineer the induced strain as a result of the large lattice mismatch and large thermal expansion coefficient difference between GaN and silicon. …”
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  16. 4436
    “…Furthermore, by applying this laser cleaning technique to the channel and contacts of graphene field-effect transistors (GFETs), higher carrier mobility as well as lower contact resistance can be realized. …”
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  17. 4437
    “…Polymorphism in MoTe(2) presents new opportunities in developing phase-change memory, high- performance transistors, and spintronic devices. However, it also poses challenges in synthesizing homogeneous MoTe(2) with a precisely controlled phase. …”
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  18. 4438
  19. 4439
    “…Quantitatively, a nearly ten-fold faster decay rate of metallic CNTs leads to a spontaneous purification of the predicted 99.9999% semiconducting CNTs at a length of 154 mm, and the longest CNT can be 650 mm through an optimized reactor. Transistors fabricated on them deliver a high current of 14 μA μm(−1) with on/off ratio around 10(8) and mobility over 4000 cm(2) V(−1) s(−1). …”
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  20. 4440
    “…The recent reports of various photodetectors based on molybdenum disulfide (MoS(2)) field effect transistors showed that it was difficult to obtain optoelectronic performances in the broad detection range [visible–infrared (IR)] applicable to various fields. …”
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