Mostrando 101 - 120 Resultados de 392 Para Buscar '"VLSI"', tiempo de consulta: 0.31s Limitar resultados
  1. 101
    “… Formal Verification: An Essential Toolkit for Modern VLSI Design presents practical approaches for design and validation, with hands-on advice for working engineers integrating these techniques into their work. …”
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  2. 102
  3. 103
    por Liu, Xiao, Xu, Qiang
    Publicado 2014
    “…This book first provides a comprehensive coverage of state-of-the-art validation solutions based on real-time signal tracing to guarantee the correctness of VLSI circuits.  The authors discuss several key challenges in post-silicon validation and provide automated solutions that are systematic and cost-effective.  …”
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  4. 104
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  6. 106
    por Dhiman, Rohit, Chandel, Rajeevan
    Publicado 2019
    “…VLSI and Post-CMOS Electronics is a useful reference guide for researchers, engineers and advanced students working in the area of design and modelling of VLSI and post-CMOS devices and their circuits.…”
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  7. 107
    por Dhiman, Rohit, Chandel, Rajeevan
    Publicado 2019
    “…VLSI and Post-CMOS Electronics is a useful reference guide for researchers, engineers and advanced students working in the area of design and modelling of VLSI and post-CMOS devices and their circuits.…”
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  8. 108
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  13. 113
    por Clark, Robert D.
    Publicado 2014
    “…Atomic Layer Deposition (ALD) is a common and proven deposition method for all of the applications discussed for use in future VLSI manufacturing.…”
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  18. 118
    por Shen, Ruijing, Tan, Sheldon X -D, Yu, Hao
    Publicado 2012
    “…Since process variation and chip performance uncertainties have become more pronounced as technologies scale down into the nanometer regime, accurate and efficient modeling or characterization of variations from the device to the architecture level have  become imperative for the successful design of VLSI chips. This book provides readers with tools for variation-aware design methodologies and computer-aided design (CAD) of VLSI systems, in the presence of process variations at the nanometer scale. …”
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  19. 119
  20. 120
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