“…In this work, we applied the post-metal annealing (PMA) process under the condition of deuterium forming gas, at 10 atm and 300 °C for 30 min, to reduce the noise level of amorphous-Si microbolometers. …”
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“…The effect of different post metal annealing conditions on the trap response was analyzed and it was found that the N(2):H(2) mixed FGA passivates the border trap quite well, whereas N(2)-based RTA performs better on interface traps. …”
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“…Thus, in natural conditions, plants may be subjected to post-metal-stress conditions. The review also discusses the mechanism behind efficient recovery and the impact of post metal stress on future plant performance—possible acquisition of stress memory, adaptation to unfavorable conditions and cross-tolerance towards other stress factors.…”
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“…This paper investigates the impacts of post metal annealing (PMA) and post deposition annealing (PDA) on the electrical performance of Ge p-type metal-oxide-semiconductor field-effect transistors (pMOSFETs) with ZrO(2) dielectric. …”
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“…The importance of manufacturing steps, ingredients involved in Agaria’s iron making process, and post-metal treatment using metal-working operation called hot hammering (forging) is highlighted. …”
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“…This response to lead occurs within 6 h post metal treatment. During the same time interval there was a surge in the growth of bacteria along with an enhancement in the putrescine levels. …”
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“…Screening, selection and deposition of high-k gate dielectrics, post-deposition thermal processing, choice of metal gate structure and its post-metal deposition annealing are important parameters to optimize the process and possibly address the energy efficiency of CMOS electronics at nano scales. …”
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“…Post-metal annealing temperature-dependent forming-free resistive switching memory characteristics, Fowler-Nordheim (F-N) tunneling at low resistance state, and after reset using a new W/WO(3)/WO(x)/W structure have been investigated for the first time. …”
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“…In an investigation of two different post-metal annealing effects on border traps, the border trap was more effectively passivated by N(2)-based forming gas annealing (FGA) compared with rapid thermal annealing (RTA), whereas a lower interface state density was observed in RTA-annealed samples compared with FGA-annealed samples. …”
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“…The changes between the initial and post-metal removal CCD were 60.2%±11.2% and 57.3%±10.4%, respectively, with no statistical difference (p=0.241). …”
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“…It is found that Zn(2+) coordination in post-metallization of TDCOF can act as an “inducer” which elongates the target bond and facilitates its fracture in hydrolyzation reactions to create dangling bonds. …”
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“…In this study, a series of porphyrin-based COFs (TAPP-x-COF) with various transition metals (Co, Ni, Fe) were synthesized via a facile post-metallization strategy under solvothermal synthesis. …”
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“…Reactions of a cis-blocked Pd(ii) 90° acceptor [cis-(tmeda)Pd(NO(3))(2)] (M) with 1,4-di(1H-tetrazol-5-yl)benzene (H(2)L(1)) and [1,3,5-tri(1H-tetrazol-5-yl)benzene] (H(3)L(2)) in 1 : 1 and 3 : 2 molar ratios respectively, yielded soft metallogels G1 and G2 [tmeda = N,N,N′,N′-tetramethylethane-1,2-diamine]. Post-metalation of the gels G1 and G2 with M yielded highly water-soluble edge and face directed self-assembled Pd(12) tetrahedral nano-cages T1 and T2, respectively. …”
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“…We studied the impact of H(2) pressure during post-metallization annealing on the chemical composition of a HfO(2)/Al(2)O(3) gate stack on a HCl wet-cleaned In(0.53)Ga(0.47)As substrate by comparing the forming gas annealing (at atmospheric pressure with a H(2) partial pressure of 0.04 bar) and H(2) high-pressure annealing (H(2)-HPA at 30 bar) methods. …”
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“…During Al(2)O(3) deposition processing, the O(2) plasma exposure time was adjusted, and H(2) plasma treatment as well as post-metallization annealing (PMA) were performed as posttreatments. …”
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“…Two novel complexes isolated from reactions of the di-tert-butylzincate and crystallographically characterised, namely the pre-metallation complex [{(iPr)(2)N(Ph)C=O}LiZn(cis-DMP)tBu(2)] and the post-metallation complex [(TMEDA)Li(cis-DMP){2-[1-C(=O)N(iPr)(2)]C(6)H(4)}Zn(tBu)], shed valuable light on the structures and mechanisms involved in these alkali-metal-mediated zincation reactions. …”
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