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  1. 4921
    “…For organic devices such as diodes and transistors, higher charge carrier mobilities are paramount to achieve high performance. …”
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  2. 4922
    “…Gate-controlled amplifiable ultraviolet phototransistors have been demonstrated using AlGaN/GaN high-electron-mobility transistors (HEMTs) with very thin AlGaN barriers. In the AlGaN/GaN HEMTs, the dark current between the source and drain increases with increasing thickness of the AlGaN barrier from 10 to 30 nm owing to the increase in piezoelectric polarization-induced two-dimensional electron gas (2-DEG). …”
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  3. 4923
    “…Using V‐doped WSe(2) as vdW contact, the on‐state current and on/off ratio of WSe(2)‐based field‐effect transistors have been substantially improved (from ≈10(–8) to 10(–5) A; ≈10(4) to 10(8)), compared to metal contacts. …”
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  4. 4924
    “…For the formation of nano-scale Ge channels in vertical Gate-all-around field-effect transistors (vGAAFETs), the selective isotropic etching of Ge selective to Ge(0.8)Si(0.2) was considered. …”
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  5. 4925
  6. 4926
    “…More importantly, the observation of clear current-rectifying effects produced at the semiconductor heterojunctions with properly selected contacting faces or planes implies that novel field-effect transistors (FETs) can be fabricated using this design strategy, which should integrate well with current chip manufacturing processes.…”
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  7. 4927
    “…The graphene field-effect transistors (GFETs), exposed to DUV in air and pure O(2), exhibited p-type doping behavior, whereas those exposed in vacuum and pure N(2) gas showed n-type doping. …”
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  8. 4928
    “…This finding may assist in the future development of MoS(2)-based electronic and optoelectronic devices such as transistors and photodetectors.…”
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  9. 4929
    “…However, analog circuits are sensitive to process-induced variation among transistors in a chip (“device mismatch”). For neuromorphic implementation of Spiking Neural Networks (SNNs), mismatch causes parameter variation between identically-configured neurons and synapses. …”
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  10. 4930
    “…Hafnium oxide (HfO(x)) films have a wide range of applications in solid-state devices, including metal–oxide–semiconductor field-effect transistors (MOSFETs). The growth of HfO(x) films from the metal precursor tetrakis(ethylmethylamino) hafnium with La(NO(3))(3)·6H(2)O solution (LNS) as an oxidant was investigated. …”
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  11. 4931
    “…However, this is crucial for the fabrication of field-effect transistors (FETs). In this work, the atomic layer deposition growth of sub-5 nm La(2)O(3)/Al(2)O(3) nanolaminates on MoS(2) using different oxidants (H(2)O and O(3)) was investigated. …”
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  12. 4932
  13. 4933
    “…The prospect of 2‐dimensional electron gases (2DEGs) possessing high mobility at room temperature in wide‐bandgap perovskite stannates is enticing for oxide electronics, particularly to realize transparent and high‐electron mobility transistors. Nonetheless only a small number of studies to date report 2DEGs in BaSnO(3)‐based heterostructures. …”
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  14. 4934
    “…In this study, threshold voltage (V(th)) variability was investigated in silicon nanowire field-effect transistors (SNWFETs) with short gate-lengths of 15–22 nm and various channel diameters (D(NW)) of 7, 9, and 12 nm. …”
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  15. 4935
  16. 4936
    “…The AlN thin films investigated in this study have excellent material properties, and the proposed process could be a less expensive method of growing high-quality GaN thin films for various applications in GaN-based power transistors and Si integrated circuits.…”
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  17. 4937
    “…[Image: see text] This article reports an improvement in the performance of the hafnium oxide-based (HfO(2)) ferroelectric field-effect transistors (FeFET) achieved by a synergistic approach of interfacial layer (IL) engineering and READ-voltage optimization. …”
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  18. 4938
    “…The objective is the future development of electro-photonic systems in the same c-Si wafer, containing transistors, sensors, LEDs and waveguides. Two different heterojunction LEDs were fabricated consisting of PIN and PIN(+)N structures, where a-Si(1−x)C(x):H thin films were used as P-type and I-type layers, while an N-type c-Si substrate was used as an active part of the device. …”
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  19. 4939
    “…We obtained rapid and sensitive virus detection beyond the Debye length limitation by exploiting aptamers coupled with alkaline phosphatases, which catalytically generate free hydrogen ions which can readily be measured on pH meters or ion-sensitive field-effect transistors. Furthermore, we demonstrated the detection of the viruses of approximately 100 copies/μL in 10 min, surpassing the capability of typical immunochromatographic assays. …”
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  20. 4940
    “…Ion-sensitive field-effect transistors (ISFETs) detect specific ions in solutions that enable straightforward, fast, and inexpensive sensors compared to other benchtop equipment. …”
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