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Ion implantation in semiconductors: silicon and germanium
Autores principales: | , , |
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Lenguaje: | eng |
Publicado: |
Academic Press
1970
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/100622 |
_version_ | 1780876413804478464 |
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author | Mayer, James W Davies, John A Eriksson, Lennart |
author_facet | Mayer, James W Davies, John A Eriksson, Lennart |
author_sort | Mayer, James W |
collection | CERN |
id | cern-100622 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 1970 |
publisher | Academic Press |
record_format | invenio |
spelling | cern-1006222021-04-22T06:16:02Zhttp://cds.cern.ch/record/100622engMayer, James WDavies, John AEriksson, LennartIon implantation in semiconductors: silicon and germaniumEngineeringAcademic Pressoai:cds.cern.ch:1006221970 |
spellingShingle | Engineering Mayer, James W Davies, John A Eriksson, Lennart Ion implantation in semiconductors: silicon and germanium |
title | Ion implantation in semiconductors: silicon and germanium |
title_full | Ion implantation in semiconductors: silicon and germanium |
title_fullStr | Ion implantation in semiconductors: silicon and germanium |
title_full_unstemmed | Ion implantation in semiconductors: silicon and germanium |
title_short | Ion implantation in semiconductors: silicon and germanium |
title_sort | ion implantation in semiconductors: silicon and germanium |
topic | Engineering |
url | http://cds.cern.ch/record/100622 |
work_keys_str_mv | AT mayerjamesw ionimplantationinsemiconductorssiliconandgermanium AT daviesjohna ionimplantationinsemiconductorssiliconandgermanium AT erikssonlennart ionimplantationinsemiconductorssiliconandgermanium |