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Ion implantation in semiconductors: silicon and germanium

Detalles Bibliográficos
Autores principales:	Mayer, James W, Davies, John A, Eriksson, Lennart
Lenguaje:	eng
Publicado:	Academic Press 1970
Materias:	Engineering
Acceso en línea:	http://cds.cern.ch/record/100622

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