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Total Ionizing Dose effects in 130-nm commercial CMOS technologies for HEP experiments
The impact of foundry-to-foundry variability and bias conditions during irradiation on the Total Ionizing Dose (TID) response of commercial 130-nm CMOS technologies have been investigated for applications in High Energy Physics (HEP) experiments. n- and p-channel MOSFETs from three different manufac...
Autores principales: | , , , , , , , , |
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Lenguaje: | eng |
Publicado: |
2007
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1016/j.nima.2007.07.068 http://cds.cern.ch/record/1064030 |