Cargando…
Progress in Use of Ultra-High Vacuum Cathodic Arcs for Deposition of Thin Film Superconducting Layers
Autores principales: | , , , , , , , , , , , , |
---|---|
Lenguaje: | eng |
Publicado: |
2006
|
Materias: | |
Acceso en línea: | http://cds.cern.ch/record/1090864 |