Cargando…

Sputtering of cryogenic films of hydrogen by keV ions: Thickness dependence and surface morphology

The sputtering yield induced by keV hydrogen ions measured at CERN and at Risø National Laboratory for solid H2 and D2 at temperatures below 4.2 K decreases with increasing film thickness from about 100 × 1015 molecules/cm2. For a film thickness comparable to or larger than the ion range the data fr...

Descripción completa

Detalles Bibliográficos
Autores principales: Schou, Jørgen, Hilleret, Noel
Lenguaje:eng
Publicado: 2009
Materias:
Acceso en línea:https://dx.doi.org/10.1016/j.nimb.2009.05.024
http://cds.cern.ch/record/1265169