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Sputtering of cryogenic films of hydrogen by keV ions: Thickness dependence and surface morphology
The sputtering yield induced by keV hydrogen ions measured at CERN and at Risø National Laboratory for solid H2 and D2 at temperatures below 4.2 K decreases with increasing film thickness from about 100 × 1015 molecules/cm2. For a film thickness comparable to or larger than the ion range the data fr...
| Autores principales: | , |
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| Lenguaje: | eng |
| Publicado: |
2009
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| Acceso en línea: | https://dx.doi.org/10.1016/j.nimb.2009.05.024 http://cds.cern.ch/record/1265169 |