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Characterisation of a Thin Fully Depleted SOI Pixel Sensor with High Momentum Charged Particles

This paper presents the results of the characterisation of a thin, fully depleted pixel sensor manufactured in SOI technology on high-resistivity substrate with high momentum charged particles. The sensor is thinned to 70 $\mu$m and a thin phosphor layer contact is implanted on the back-plane. Its r...

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Detalles Bibliográficos
Autores principales: Battaglia, Marco, Bisello, Dario, Contarato, Devis, Denes, Peter, Giubilato, Piero, Mattiazzo, Serena, Pantano, Devis
Lenguaje:eng
Publicado: 2012
Materias:
Acceso en línea:https://dx.doi.org/10.1016/j.nima.2012.02.019
http://cds.cern.ch/record/1422227
Descripción
Sumario:This paper presents the results of the characterisation of a thin, fully depleted pixel sensor manufactured in SOI technology on high-resistivity substrate with high momentum charged particles. The sensor is thinned to 70 $\mu$m and a thin phosphor layer contact is implanted on the back-plane. Its response is compared to that of thick sensors of same design in terms of signal and noise, detection efficiency and single point resolution based on data collected with 300 GeV pions at the CERN SPS. We observe that the charge collected and the signal-to-noise ratio scale according to the estimated thickness of the sensitive volume and the efficiency and single point resolution of the thinned chip are comparable to those measured for the thick sensors.