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A new method to correct deformations in emulsion using a precise photomask
A new method to correct the emulsion deformation, mainly produced in the development process, is developed to recover the high accuracy of nuclear emulsion as a tracking device. The method is based on a precise photomask and a careful treatment of the emulsion films. A position measurement accuracy...
| Autores principales: | , , , , , , , , , , |
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| Lenguaje: | eng |
| Publicado: |
2012
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| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1016/j.nima.2013.01.052 http://cds.cern.ch/record/1483378 |