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Statistical Performance Analysis and Modeling Techniques for Nanometer VLSI Designs

Since process variation and chip performance uncertainties have become more pronounced as technologies scale down into the nanometer regime, accurate and efficient modeling or characterization of variations from the device to the architecture level have  become imperative for the successful design o...

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Detalles Bibliográficos
Autores principales: Shen, Ruijing, Tan, Sheldon X -D, Yu, Hao
Lenguaje:eng
Publicado: Springer 2012
Materias:
Acceso en línea:https://dx.doi.org/10.1007/978-1-4614-0788-1
http://cds.cern.ch/record/1503719