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Statistical Performance Analysis and Modeling Techniques for Nanometer VLSI Designs
Since process variation and chip performance uncertainties have become more pronounced as technologies scale down into the nanometer regime, accurate and efficient modeling or characterization of variations from the device to the architecture level have become imperative for the successful design o...
Autores principales: | Shen, Ruijing, Tan, Sheldon X -D, Yu, Hao |
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Lenguaje: | eng |
Publicado: |
Springer
2012
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1007/978-1-4614-0788-1 http://cds.cern.ch/record/1503719 |
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