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Electromigration modeling at circuit layout level
Integrated circuit (IC) reliability is of increasing concern in present-day IC technology where the interconnect failures significantly increases the failure rate for ICs with decreasing interconnect dimension and increasing number of interconnect levels. Electromigration (EM) of interconnects has...
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| Lenguaje: | eng |
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Springer
2013
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| Acceso en línea: | https://dx.doi.org/10.1007/978-981-4451-21-5 http://cds.cern.ch/record/1537793 |