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Strain-engineered MOSFETs
Currently strain engineering is the main technique used to enhance the performance of advanced silicon-based metal-oxide-semiconductor field-effect transistors (MOSFETs). Written from an engineering application standpoint, Strain-Engineered MOSFETs introduces promising strain techniques to fabricate...
| Autores principales: | , |
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| Lenguaje: | eng |
| Publicado: |
CRC Press
2012
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| Materias: | |
| Acceso en línea: | http://cds.cern.ch/record/1616696 |