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Particle image velocimetry: progress towards industrial application
Autores principales: | Stanislas, M, Kompenhans, J, Westerweel, J |
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Lenguaje: | eng |
Publicado: |
Springer
2000
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1007/978-94-017-2543-9 http://cds.cern.ch/record/1629233 |
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