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Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems

Lithography is the process of patterning and etching to create integrated circuits and other devices on semiconductor wafers. Photolithography cannot be scaled down much further so in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions, scientists have turn...

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Detalles Bibliográficos
Autor principal: Feldman, Martin
Lenguaje:eng
Publicado: Woodhead Publ. 2014
Materias:
Acceso en línea:http://cds.cern.ch/record/1644592
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author Feldman, Martin
author_facet Feldman, Martin
author_sort Feldman, Martin
collection CERN
description Lithography is the process of patterning and etching to create integrated circuits and other devices on semiconductor wafers. Photolithography cannot be scaled down much further so in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions, scientists have turned to alternative nanolithography technologies. In addition to scaling issues, the increasing integration of multiple functions within a single device poses further challenges which drive innovations in nanolithography and nanofabrication. Chapters cover lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography, and applications of nanolithography in nanoelectronics, nanophotonics and microfluidics.
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institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2014
publisher Woodhead Publ.
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spelling cern-16445922021-04-21T21:21:14Zhttp://cds.cern.ch/record/1644592engFeldman, MartinNanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systemsOther SubjectsLithography is the process of patterning and etching to create integrated circuits and other devices on semiconductor wafers. Photolithography cannot be scaled down much further so in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions, scientists have turned to alternative nanolithography technologies. In addition to scaling issues, the increasing integration of multiple functions within a single device poses further challenges which drive innovations in nanolithography and nanofabrication. Chapters cover lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography, and applications of nanolithography in nanoelectronics, nanophotonics and microfluidics.Woodhead Publ.oai:cds.cern.ch:16445922014
spellingShingle Other Subjects
Feldman, Martin
Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems
title Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems
title_full Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems
title_fullStr Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems
title_full_unstemmed Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems
title_short Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems
title_sort nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems
topic Other Subjects
url http://cds.cern.ch/record/1644592
work_keys_str_mv AT feldmanmartin nanolithographytheartoffabricatingnanoelectronicandnanophotonicdevicesandsystems