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Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems
Lithography is the process of patterning and etching to create integrated circuits and other devices on semiconductor wafers. Photolithography cannot be scaled down much further so in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions, scientists have turn...
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Lenguaje: | eng |
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Woodhead Publ.
2014
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Acceso en línea: | http://cds.cern.ch/record/1644592 |
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author | Feldman, Martin |
author_facet | Feldman, Martin |
author_sort | Feldman, Martin |
collection | CERN |
description | Lithography is the process of patterning and etching to create integrated circuits and other devices on semiconductor wafers. Photolithography cannot be scaled down much further so in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions, scientists have turned to alternative nanolithography technologies. In addition to scaling issues, the increasing integration of multiple functions within a single device poses further challenges which drive innovations in nanolithography and nanofabrication. Chapters cover lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography, and applications of nanolithography in nanoelectronics, nanophotonics and microfluidics. |
id | cern-1644592 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2014 |
publisher | Woodhead Publ. |
record_format | invenio |
spelling | cern-16445922021-04-21T21:21:14Zhttp://cds.cern.ch/record/1644592engFeldman, MartinNanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systemsOther SubjectsLithography is the process of patterning and etching to create integrated circuits and other devices on semiconductor wafers. Photolithography cannot be scaled down much further so in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions, scientists have turned to alternative nanolithography technologies. In addition to scaling issues, the increasing integration of multiple functions within a single device poses further challenges which drive innovations in nanolithography and nanofabrication. Chapters cover lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography, and applications of nanolithography in nanoelectronics, nanophotonics and microfluidics.Woodhead Publ.oai:cds.cern.ch:16445922014 |
spellingShingle | Other Subjects Feldman, Martin Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems |
title | Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems |
title_full | Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems |
title_fullStr | Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems |
title_full_unstemmed | Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems |
title_short | Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems |
title_sort | nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems |
topic | Other Subjects |
url | http://cds.cern.ch/record/1644592 |
work_keys_str_mv | AT feldmanmartin nanolithographytheartoffabricatingnanoelectronicandnanophotonicdevicesandsystems |