Niobium Nitride Thin Films deposited by High Temperature Chemical Vapor Deposition

Detalles Bibliográficos
Autor principal: Mercier, F
Formato: info:eu-repo/semantics/article
Lenguaje:eng
Publicado: 2014
Materias:
Accelerators and Storage Rings
12: Innovative Radio Frequency Technologies (RF)
12.1: Coordination and Communication
Acceso en línea:http://cds.cern.ch/record/1953617

Internet

http://cds.cern.ch/record/1953617

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