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Computational explorations in magnetron sputtering

Magnetron Sputtering is a widely used industrial process for depositing thin films. PVD films are found in everything from the moisture barriers in potato chip bags to the interconnects of modern semiconductor devices. This book walks you through the physics of Magnetron Sputtering in a step-by-st...

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Detalles Bibliográficos
Autor principal: McInerney, E J
Lenguaje:eng
Publicado: Basic Numerics Press 2014
Materias:
Acceso en línea:http://cds.cern.ch/record/1969710
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author McInerney, E J
author_facet McInerney, E J
author_sort McInerney, E J
collection CERN
description Magnetron Sputtering is a widely used industrial process for depositing thin films. PVD films are found in everything from the moisture barriers in potato chip bags to the interconnects of modern semiconductor devices. This book walks you through the physics of Magnetron Sputtering in a step-by-step fashion. Starting with the magnetic fields crucial to efficient operation, the book then looks at the electric fields that power the sputter process, the motion of electrons in the plasma, target erosion and finally deposition. The reader is encouraged to explore this fascinating topic by actively following along. A series of simple computer models is developed, ultimately leading to predictive models of target erosion and deposition uniformity. By working through these models, readers can build their intuition of PVD processes and develop a deeper appreciation of the underlying physics.
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institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2014
publisher Basic Numerics Press
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spelling cern-19697102021-04-21T20:49:03Zhttp://cds.cern.ch/record/1969710engMcInerney, E JComputational explorations in magnetron sputteringEngineeringMagnetron Sputtering is a widely used industrial process for depositing thin films. PVD films are found in everything from the moisture barriers in potato chip bags to the interconnects of modern semiconductor devices. This book walks you through the physics of Magnetron Sputtering in a step-by-step fashion. Starting with the magnetic fields crucial to efficient operation, the book then looks at the electric fields that power the sputter process, the motion of electrons in the plasma, target erosion and finally deposition. The reader is encouraged to explore this fascinating topic by actively following along. A series of simple computer models is developed, ultimately leading to predictive models of target erosion and deposition uniformity. By working through these models, readers can build their intuition of PVD processes and develop a deeper appreciation of the underlying physics.Basic Numerics Pressoai:cds.cern.ch:19697102014-10-31
spellingShingle Engineering
McInerney, E J
Computational explorations in magnetron sputtering
title Computational explorations in magnetron sputtering
title_full Computational explorations in magnetron sputtering
title_fullStr Computational explorations in magnetron sputtering
title_full_unstemmed Computational explorations in magnetron sputtering
title_short Computational explorations in magnetron sputtering
title_sort computational explorations in magnetron sputtering
topic Engineering
url http://cds.cern.ch/record/1969710
work_keys_str_mv AT mcinerneyej computationalexplorationsinmagnetronsputtering