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2nd International Conference on Ion Implantation in Semiconductors, Physics and Technology, Fundamental and Applied Aspects
In recent years great progress has been made in the field of ion implantation, particularly with respect to applications in semiconductors. It would be impos sible not to note the growing interest in this field, both by research groups and those directly concerned with production of devices. Furthe...
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| Lenguaje: | eng |
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Springer
1971
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| Acceso en línea: | https://dx.doi.org/10.1007/978-3-642-80660-5 http://cds.cern.ch/record/2007753 |