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Plasma diagnostics: surface analysis and interactions

Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Plasmas are used in microelectronics to process semiconductors (etching of patterns for microcircuits,...

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Detalles Bibliográficos
Autores principales: Auciello, Orlando, Flamm, Daniel L
Lenguaje:eng
Publicado: Elsevier Science 2013
Materias:
Acceso en línea:http://cds.cern.ch/record/2050256
Descripción
Sumario:Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Plasmas are used in microelectronics to process semiconductors (etching of patterns for microcircuits, plasma-induced deposition of thin films, etc.); plasmas produce deleterious erosion effects on surfaces of materials used for fusion devices and spaceships exposed to the low earth environment.Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical a