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Plasma diagnostics: surface analysis and interactions
Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Plasmas are used in microelectronics to process semiconductors (etching of patterns for microcircuits,...
Autores principales: | , |
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Lenguaje: | eng |
Publicado: |
Elsevier Science
2013
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/2050256 |
_version_ | 1780948082000658432 |
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author | Auciello, Orlando Flamm, Daniel L |
author_facet | Auciello, Orlando Flamm, Daniel L |
author_sort | Auciello, Orlando |
collection | CERN |
description | Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Plasmas are used in microelectronics to process semiconductors (etching of patterns for microcircuits, plasma-induced deposition of thin films, etc.); plasmas produce deleterious erosion effects on surfaces of materials used for fusion devices and spaceships exposed to the low earth environment.Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical a |
id | cern-2050256 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2013 |
publisher | Elsevier Science |
record_format | invenio |
spelling | cern-20502562021-04-21T20:06:14Zhttp://cds.cern.ch/record/2050256engAuciello, OrlandoFlamm, Daniel LPlasma diagnostics: surface analysis and interactionsGeneral Theoretical PhysicsPlasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Plasmas are used in microelectronics to process semiconductors (etching of patterns for microcircuits, plasma-induced deposition of thin films, etc.); plasmas produce deleterious erosion effects on surfaces of materials used for fusion devices and spaceships exposed to the low earth environment.Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical aElsevier Scienceoai:cds.cern.ch:20502562013 |
spellingShingle | General Theoretical Physics Auciello, Orlando Flamm, Daniel L Plasma diagnostics: surface analysis and interactions |
title | Plasma diagnostics: surface analysis and interactions |
title_full | Plasma diagnostics: surface analysis and interactions |
title_fullStr | Plasma diagnostics: surface analysis and interactions |
title_full_unstemmed | Plasma diagnostics: surface analysis and interactions |
title_short | Plasma diagnostics: surface analysis and interactions |
title_sort | plasma diagnostics: surface analysis and interactions |
topic | General Theoretical Physics |
url | http://cds.cern.ch/record/2050256 |
work_keys_str_mv | AT aucielloorlando plasmadiagnosticssurfaceanalysisandinteractions AT flammdaniell plasmadiagnosticssurfaceanalysisandinteractions |