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Design for manufacturability with advanced lithography
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufactur...
| Autores principales: | , |
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| Lenguaje: | eng |
| Publicado: |
Springer
2016
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| Acceso en línea: | https://dx.doi.org/10.1007/978-3-319-20385-0 http://cds.cern.ch/record/2112749 |