Cargando…
Plasma etching processes for interconnect realization in VLSI
| Autor principal: | |
|---|---|
| Lenguaje: | eng |
| Publicado: |
Elsevier Science
2015
|
| Materias: | |
| Acceso en línea: | http://cds.cern.ch/record/2123255 |
| _version_ | 1780949509769003008 |
|---|---|
| author | Posseme, Nicolas |
| author_facet | Posseme, Nicolas |
| author_sort | Posseme, Nicolas |
| collection | CERN |
| id | cern-2123255 |
| institution | Organización Europea para la Investigación Nuclear |
| language | eng |
| publishDate | 2015 |
| publisher | Elsevier Science |
| record_format | invenio |
| spelling | cern-21232552021-04-21T19:51:51Zhttp://cds.cern.ch/record/2123255engPosseme, NicolasPlasma etching processes for interconnect realization in VLSIEngineeringElsevier Scienceoai:cds.cern.ch:21232552015 |
| spellingShingle | Engineering Posseme, Nicolas Plasma etching processes for interconnect realization in VLSI |
| title | Plasma etching processes for interconnect realization in VLSI |
| title_full | Plasma etching processes for interconnect realization in VLSI |
| title_fullStr | Plasma etching processes for interconnect realization in VLSI |
| title_full_unstemmed | Plasma etching processes for interconnect realization in VLSI |
| title_short | Plasma etching processes for interconnect realization in VLSI |
| title_sort | plasma etching processes for interconnect realization in vlsi |
| topic | Engineering |
| url | http://cds.cern.ch/record/2123255 |
| work_keys_str_mv | AT possemenicolas plasmaetchingprocessesforinterconnectrealizationinvlsi |