Beam test results of an ion-implanted capacitively coupled silicon strip detector processed on a 100 mm silicon wafer

Detalles Bibliográficos
Autores principales: Hietanen, I, Lindgren, J, Orava, Risto, Tuuva, T, Brenner, R, Andersson, M, Leinonen, K, Ronkainen, H, Turala, Michal, Weilhammer, Peter, Dulinski, W, Husson, D, Lounis, A, Schäffer, M, Turchetta, R, Chauveau, J
Lenguaje:eng
Publicado: 1991
Materias:
Detectors and Experimental Techniques
Acceso en línea:https://dx.doi.org/10.1016/0168-9002(91)91116-D
http://cds.cern.ch/record/223900

Internet

https://dx.doi.org/10.1016/0168-9002(91)91116-D
http://cds.cern.ch/record/223900

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