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Mask layout of multi-project wafer runs

Detalles Bibliográficos
Autores principales: Vila, Ivan, Macchiolo, Anna
Formato: info:eu-repo/semantics/article
Lenguaje:eng
Publicado: 2017
Materias:
Acceso en línea:http://cds.cern.ch/record/2297361
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author Vila, Ivan
Macchiolo, Anna
author_facet Vila, Ivan
Macchiolo, Anna
author_sort Vila, Ivan
collection CERN
format info:eu-repo/semantics/article
id cern-2297361
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2017
record_format invenio
spelling cern-22973612019-09-30T06:29:59Z http://cds.cern.ch/record/2297361 eng Vila, Ivan Macchiolo, Anna Mask layout of multi-project wafer runs Detectors and Experimental Techniques 7: Advanced hybrid pixel detectors info:eu-repo/grantAgreement/EC/FP7/654168 info:eu-repo/semantics/openAccess Education Level info:eu-repo/semantics/article http://cds.cern.ch/record/2297361 2017
spellingShingle Detectors and Experimental Techniques
7: Advanced hybrid pixel detectors
Vila, Ivan
Macchiolo, Anna
Mask layout of multi-project wafer runs
title Mask layout of multi-project wafer runs
title_full Mask layout of multi-project wafer runs
title_fullStr Mask layout of multi-project wafer runs
title_full_unstemmed Mask layout of multi-project wafer runs
title_short Mask layout of multi-project wafer runs
title_sort mask layout of multi-project wafer runs
topic Detectors and Experimental Techniques
7: Advanced hybrid pixel detectors
url http://cds.cern.ch/record/2297361
http://cds.cern.ch/record/2297361
work_keys_str_mv AT vilaivan masklayoutofmultiprojectwaferruns
AT macchioloanna masklayoutofmultiprojectwaferruns