Cargando…
EUV lithography
Extreme ultraviolet lithography (EUVL) is the principal lithography technology-beyond the current 193-nm-based optical lithography-aiming to manufacture computer chips, and recent progress has been made on several fronts: EUV light sources, scanners, optics, contamination control, masks and mask han...
| Autor principal: | |
|---|---|
| Lenguaje: | eng |
| Publicado: |
Society of Photo-Optical Instrumentation Engineers (SPIE)
2018
|
| Materias: | |
| Acceso en línea: | http://cds.cern.ch/record/2317915 |