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EUV lithography

Extreme ultraviolet lithography (EUVL) is the principal lithography technology-beyond the current 193-nm-based optical lithography-aiming to manufacture computer chips, and recent progress has been made on several fronts: EUV light sources, scanners, optics, contamination control, masks and mask han...

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Detalles Bibliográficos
Autor principal:	Bakshi, Vivek
Lenguaje:	eng
Publicado:	Society of Photo-Optical Instrumentation Engineers (SPIE) 2018
Materias:	Engineering
Acceso en línea:	http://cds.cern.ch/record/2317915

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