Cargando…
Use of ultra thin semiconductive layers as passivation in microstrip gas chambers
| Autores principales: | , , , , |
|---|---|
| Lenguaje: | eng |
| Publicado: |
1993
|
| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1016/0168-9002(94)90268-2 http://cds.cern.ch/record/255580 |