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High-k gate dielectrics for CMOS technology

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conve...

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Detalles Bibliográficos
Autores principales: He, Gang, Sun, Zhaoqi
Lenguaje:eng
Publicado: John Wiley & Sons 2012
Materias:
Acceso en línea:http://cds.cern.ch/record/2630681