High-k gate dielectrics for CMOS technology

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A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conve...

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Detalles Bibliográficos
Autores principales: He, Gang, Sun, Zhaoqi
Lenguaje:eng
Publicado: John Wiley & Sons 2012
Materias:
Other Fields of Physics
Acceso en línea:http://cds.cern.ch/record/2630681
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author He, Gang
Sun, Zhaoqi
author_facet He, Gang
Sun, Zhaoqi
author_sort He, Gang
collection CERN
description A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
id cern-2630681
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2012
publisher John Wiley & Sons
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spelling cern-26306812021-04-21T18:45:37Zhttp://cds.cern.ch/record/2630681engHe, GangSun, ZhaoqiHigh-k gate dielectrics for CMOS technologyOther Fields of PhysicsA state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.John Wiley & Sonsoai:cds.cern.ch:26306812012
spellingShingle Other Fields of Physics
He, Gang
Sun, Zhaoqi
High-k gate dielectrics for CMOS technology
title High-k gate dielectrics for CMOS technology
title_full High-k gate dielectrics for CMOS technology
title_fullStr High-k gate dielectrics for CMOS technology
title_full_unstemmed High-k gate dielectrics for CMOS technology
title_short High-k gate dielectrics for CMOS technology
title_sort high-k gate dielectrics for cmos technology
topic Other Fields of Physics
url http://cds.cern.ch/record/2630681
work_keys_str_mv AT hegang highkgatedielectricsforcmostechnology
AT sunzhaoqi highkgatedielectricsforcmostechnology

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