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High-k gate dielectrics for CMOS technology
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conve...
| Autores principales: | , |
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| Lenguaje: | eng |
| Publicado: |
John Wiley & Sons
2012
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| Acceso en línea: | http://cds.cern.ch/record/2630681 |
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