Hyperfine field and fraction in high field site for implanted $^{221}$FrFe

Detalles Bibliográficos
Autores principales: Lindroos, M, Richards, P L, Ríkovská, J, Stone, N J, Nishimura, K, Oliveira, I S
Lenguaje:eng
Publicado: 1992
Materias:
Other Fields of Physics
Acceso en línea:https://dx.doi.org/10.1016/0168-583X(92)95470-C
http://cds.cern.ch/record/265015

Internet

https://dx.doi.org/10.1016/0168-583X(92)95470-C
http://cds.cern.ch/record/265015

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