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Hyperfine field and fraction in high field site for implanted $^{221}$FrFe

Detalles Bibliográficos
Autores principales: Lindroos, M, Richards, P L, Ríkovská, J, Stone, N J, Nishimura, K, Oliveira, I S
Lenguaje:eng
Publicado: 1992
Materias:
Acceso en línea:https://dx.doi.org/10.1016/0168-583X(92)95470-C
http://cds.cern.ch/record/265015
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author Lindroos, M
Richards, P L
Ríkovská, J
Stone, N J
Nishimura, K
Oliveira, I S
author_facet Lindroos, M
Richards, P L
Ríkovská, J
Stone, N J
Nishimura, K
Oliveira, I S
author_sort Lindroos, M
collection CERN
id cern-265015
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 1992
record_format invenio
spelling cern-2650152019-09-30T06:29:59Zdoi:10.1016/0168-583X(92)95470-Chttp://cds.cern.ch/record/265015engLindroos, MRichards, P LRíkovská, JStone, N JNishimura, KOliveira, I SHyperfine field and fraction in high field site for implanted $^{221}$FrFeOther Fields of Physicsoai:cds.cern.ch:2650151992
spellingShingle Other Fields of Physics
Lindroos, M
Richards, P L
Ríkovská, J
Stone, N J
Nishimura, K
Oliveira, I S
Hyperfine field and fraction in high field site for implanted $^{221}$FrFe
title Hyperfine field and fraction in high field site for implanted $^{221}$FrFe
title_full Hyperfine field and fraction in high field site for implanted $^{221}$FrFe
title_fullStr Hyperfine field and fraction in high field site for implanted $^{221}$FrFe
title_full_unstemmed Hyperfine field and fraction in high field site for implanted $^{221}$FrFe
title_short Hyperfine field and fraction in high field site for implanted $^{221}$FrFe
title_sort hyperfine field and fraction in high field site for implanted $^{221}$frfe
topic Other Fields of Physics
url https://dx.doi.org/10.1016/0168-583X(92)95470-C
http://cds.cern.ch/record/265015
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AT rikovskaj hyperfinefieldandfractioninhighfieldsiteforimplanted221frfe
AT stonenj hyperfinefieldandfractioninhighfieldsiteforimplanted221frfe
AT nishimurak hyperfinefieldandfractioninhighfieldsiteforimplanted221frfe
AT oliveirais hyperfinefieldandfractioninhighfieldsiteforimplanted221frfe