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Advanced Ta-based diffusion barriers for Cu interconnects
Autor principal: | |
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Lenguaje: | eng |
Publicado: |
Nova Science Publishers
2008
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/2651687 |
_version_ | 1780960926118182912 |
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author | Hubner, Rene |
author_facet | Hubner, Rene |
author_sort | Hubner, Rene |
collection | CERN |
id | cern-2651687 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2008 |
publisher | Nova Science Publishers |
record_format | invenio |
spelling | cern-26516872021-04-21T18:37:57Zhttp://cds.cern.ch/record/2651687engHubner, ReneAdvanced Ta-based diffusion barriers for Cu interconnectsEngineeringNova Science Publishersoai:cds.cern.ch:26516872008 |
spellingShingle | Engineering Hubner, Rene Advanced Ta-based diffusion barriers for Cu interconnects |
title | Advanced Ta-based diffusion barriers for Cu interconnects |
title_full | Advanced Ta-based diffusion barriers for Cu interconnects |
title_fullStr | Advanced Ta-based diffusion barriers for Cu interconnects |
title_full_unstemmed | Advanced Ta-based diffusion barriers for Cu interconnects |
title_short | Advanced Ta-based diffusion barriers for Cu interconnects |
title_sort | advanced ta-based diffusion barriers for cu interconnects |
topic | Engineering |
url | http://cds.cern.ch/record/2651687 |
work_keys_str_mv | AT hubnerrene advancedtabaseddiffusionbarriersforcuinterconnects |