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Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses

Detalles Bibliográficos
Autor principal: Borghello, Giulio
Lenguaje:eng
Publicado: 2019
Materias:
Acceso en línea:http://cds.cern.ch/record/2680840
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author Borghello, Giulio
author_facet Borghello, Giulio
author_sort Borghello, Giulio
collection CERN
id cern-2680840
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2019
record_format invenio
spelling cern-26808402019-09-30T06:29:59Zhttp://cds.cern.ch/record/2680840engBorghello, GiulioIonizing radiation effects in nanoscale CMOS technologies exposed to ultra-high dosesEngineeringCERN-THESIS-2018-430oai:cds.cern.ch:26808402019-07-02T08:25:09Z
spellingShingle Engineering
Borghello, Giulio
Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses
title Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses
title_full Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses
title_fullStr Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses
title_full_unstemmed Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses
title_short Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses
title_sort ionizing radiation effects in nanoscale cmos technologies exposed to ultra-high doses
topic Engineering
url http://cds.cern.ch/record/2680840
work_keys_str_mv AT borghellogiulio ionizingradiationeffectsinnanoscalecmostechnologiesexposedtoultrahighdoses