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Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses
Autor principal: | |
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Lenguaje: | eng |
Publicado: |
2019
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/2680840 |
_version_ | 1780962990341750784 |
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author | Borghello, Giulio |
author_facet | Borghello, Giulio |
author_sort | Borghello, Giulio |
collection | CERN |
id | cern-2680840 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2019 |
record_format | invenio |
spelling | cern-26808402019-09-30T06:29:59Zhttp://cds.cern.ch/record/2680840engBorghello, GiulioIonizing radiation effects in nanoscale CMOS technologies exposed to ultra-high dosesEngineeringCERN-THESIS-2018-430oai:cds.cern.ch:26808402019-07-02T08:25:09Z |
spellingShingle | Engineering Borghello, Giulio Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses |
title | Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses |
title_full | Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses |
title_fullStr | Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses |
title_full_unstemmed | Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses |
title_short | Ionizing radiation effects in nanoscale CMOS technologies exposed to ultra-high doses |
title_sort | ionizing radiation effects in nanoscale cmos technologies exposed to ultra-high doses |
topic | Engineering |
url | http://cds.cern.ch/record/2680840 |
work_keys_str_mv | AT borghellogiulio ionizingradiationeffectsinnanoscalecmostechnologiesexposedtoultrahighdoses |