Cargando…
Flash lamp annealing: from basics to applications
This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduction to the FLA technology and its physical background. Advantages, drawbacks and process issues are addressed in detail and allow the reade...
Autores principales: | Rebohle, Lars, Prucnal, Slawomir, Reichel, Denise |
---|---|
Lenguaje: | eng |
Publicado: |
Springer
2019
|
Materias: | |
Acceso en línea: | https://dx.doi.org/10.1007/978-3-030-23299-3 http://cds.cern.ch/record/2685035 |
Ejemplares similares
-
B20 Weyl Semimetal
CoSi Film Fabricated by Flash-Lamp
Annealing
por: Li, Zichao, et al.
Publicado: (2023) -
Formation of Thin NiGe Films by Magnetron Sputtering and Flash Lamp Annealing
por: Begeza, Viktor, et al.
Publicado: (2020) -
Electron Concentration Limit in Ge Doped by Ion Implantation and Flash Lamp Annealing
por: Prucnal, Slawomir, et al.
Publicado: (2020) -
Millisecond flash lamp curing for porosity generation in thin films
por: Attallah, Ahmed G., et al.
Publicado: (2023) -
Magnetism: basics and applications
por: Stefanita, Carmen-Gabriela
Publicado: (2012)