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MATERIALS LABORATORY - FOCUSED ION BEAM (FIB) XB540 BY ZEISS

A focused ion beam of gallium ions (Ga+) is used to perform micro- and nano-machining of a sample’s surface through the removal of atoms, without altering the sample’s properties. In combination with scanning electron microscopy (SEM) and various detectors, the ion beam allows us to study the micros...

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Detalles Bibliográficos
Autor principal: Vanden Broeck, Renilde
Lenguaje:eng-fre
Publicado: 2019
Acceso en línea:http://cds.cern.ch/record/2692815
Descripción
Sumario:A focused ion beam of gallium ions (Ga+) is used to perform micro- and nano-machining of a sample’s surface through the removal of atoms, without altering the sample’s properties. In combination with scanning electron microscopy (SEM) and various detectors, the ion beam allows us to study the microstructure, topography and chemical composition of cross sections and/or volumes of a material. With the microscopy set in transmission mode (STEM), nanometric resolution can be achieved.